Diffusion practice problems
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Read the Diffusion example calculations class notes.
Phosphorus is diffused into a silicon wafer using a two-step process. The process parameters are:
- deposition temperature: T1 = 825°C
- deposition time: t1 = 105 min
- drive temperature: T2 = 1025°C
- drive time: t2 = 2.83 hr.
The wafer has a constant background doping of NB = 4x1014 cm–3.
The surface concentration during the depositon step is determined by the solid-solubility limit.
For this diffusion use Ns = 1x1021 cm–3.